inner-banner-bg

Journal of Plasma Chemistry and Plasma Processing Research(JPCPPR)

ISSN: 2834-359X | DOI: 10.33140/JPCPPR

Impact Factor: 1.20

About the Journal

Journal DOI: 10.33140/JPCPPR

Editorial Panel View Editorial Board

sivachandiran loganathan

sivachandiran loganathan , PhD
Research Assistant Professor, Civil and Environmental Engineering University of Nevada reno, Reno, United States

Mingli Li

Mingli Li , PhD
Department of Systems Biology Beckman Research Institute of City of Hope, Beckman Research Institute, United States

Jeffery

Jeffery
Editorial Manager

Li-Xue Jiang

Li-Xue Jiang
Department of Chemistry Purdue University, USA

Journal of Plasma Chemistry and Plasma Processing Research provides the publications of recent advancements and fundamental research in this field. Plasma is an ionized gas, a precise fourth state of matter. “Ionized” means a minimum of 1 electron isn't bound to an atom or molecule, converting the atoms or molecules into charged ions. As temperature increases, molecules become more energetic and transform matter within the sequence: solid, liquid, gas, and eventually plasma.

Target audiences:
Plasma Chemists
Physicists
Pharmacists
Directors from Companies
Academicians
University Professors
Young Researchers
Research Scientists
Research Scholars and students

Submit Paper

Editorial Board Member Registration

If you feel like to be a part of Journal of Plasma Chemistry and Plasma Processing Research as Editor, Please register at https://www.opastpublishers.com/journal/journal-of-plasma-chemistry-and-plasma-processing-research/editor-registration (or) send an email to [email protected]

Recent Articles